Donggang Li1,2, Alexandra Levesque2, Qiang Wang1,3,2, Agnieszka Franczak2, Chun Wu1, Jean-Paul Chopart2, Jicheng He1
CMC-Computers, Materials & Continua, Vol.30, No.3, pp. 207-218, 2012, DOI:10.3970/cmc.2012.030.207
Abstract Co/Ni bilayered films were prepared on ITO glass by electrodeposition assisted with a magnetic field up to 0.5T aligned parallel to the electrode surface. The effect of a high magnetic field annealing up to 12T on morphology and microstructure of the post-deposited films was investigated by field emission scanning electronic microscopy (FE-SEM), X-ray diffraction (XRD) and atomic force microscopy (AFM). Grain shape and grain boundary in the Co/Ni morphology were modified dramatically when the high magnetic field was applied during the annealing process. Magnetic anisotropy appeared in the films due to the preferential orientation of More >
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