Home / Advanced Search

  • Title/Keywords

  • Author/Affliations

  • Journal

  • Article Type

  • Start Year

  • End Year

Update SearchingClear
  • Articles
  • Online
Search Results (1)
  • Open Access

    ARTICLE

    Plasma Etching to Enhance Visibility of Nano Particles in Nanocomposites

    Kunigal N.Shivakumar1, Shivalingappa Lingaiah2, Robert Sadler2, Matthew Sharpe2

    CMC-Computers, Materials & Continua, Vol.1, No.4, pp. 309-318, 2004, DOI:10.3970/cmc.2004.001.309

    Abstract The exfoliation and dispersion of nanoclay (2% by weight) and nanovermiculite (2% by weight) particles in a polymer matrix is analyzed using the Scanning Electron Microscope (SEM) after a low temperature air plasma etch. The plasma etch preferentially removes the polymer to expose the nanoparticles. Both Argon and air have been used as the etching media to study the etching process. SEM analysis illustrate the results of the etching in flat and edge surfaces of both nanoclay (MMT) and nanovermiculite (VMT) filled polymer. Both the MMT and VMT were dispersed using a IKA high shear More >

Displaying 1-10 on page 1 of 1. Per Page