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Silicon-mediated alleviation of Cadmium toxicity on Thujopsis dolabrata

Huang YC1, H Chen1, WJ Zhao2, WD Li1, HY Yang1, Y Sun1, L Wang1, SH Cao1
1 Polytechnical Institute of Qianjiang College, Hangzhou Normal University, Hangzhou 310036, China.
2 Hangzhou Nengda Huawei Equipment Co., Ltd, Hangzhou 310020, China.
Address correspondence to: Dr. Weidong Li, Phone: 086 0571 28861215, e-mail:

Phyton-International Journal of Experimental Botany 2016, 85(all), 283-290. https://doi.org/10.32604/phyton.2016.85.283

Abstract

We conducted pot experiments on the cypress Thujopsis dolabrata (Linn. f.) Sieb. et Zucc. in order to study the interaction of silicon (Si) and root exudates on cadmium (Cd) bioavailability in the rhizosphere,. Each variety was planted with 100 mg/kg Cd and/or 400 mg/kg Si for 210 days. The results showed that adding Si increased Cd tolerance in T. dolabrata, but that the mechanism was specifical. In T. dolabrata, Si did not prevent Cd translocation from roots to shoots, and it significantly enhanced Cd accumulation without inhibiting growth. Moreover, Si mobilized Cd from the rhizospheric soil by stimulating phenolic exudation from the roots, suggesting that Cd-chelation combined with Si-induced phenolics were involved in Cd detoxification.

Keywords

Cadmium, Rhizosphere, Root exudation, Silicon, Thujopsis dolabrata.

Cite This Article

YC, H., Chen, H., Zhao, W., Li, W., Yang, H. et al. (2016). Silicon-mediated alleviation of Cadmium toxicity on Thujopsis dolabrata. Phyton-International Journal of Experimental Botany, 85(all), 283–290.



This work is licensed under a Creative Commons Attribution 4.0 International License , which permits unrestricted use, distribution, and reproduction in any medium, provided the original work is properly cited.
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