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Graphene-Based 3D Xerogel as Adsorbent for Removal of Heavy Metal Ions from Industrial Wastewater

Purnendu, Soumitra Satapathi*

Department of Physics, Indian Institute of Technology Roorkee, Roorkee - Haridwar Highway, Uttarakhand 247667, India

* Corresponding author: email

Journal of Renewable Materials 2017, 5(2), 96-102. https://doi.org/10.7569/JRM.2016.634134

Abstract

Graphene-based 3D porous xerogel was designed through molecular self-assembly of graphene oxide on chitosan matrix and its application in removal of different heavy metal ions from wastewater was investigated. The synthesized xerogel was characterized through FTIR, SEM, XRD and BET surface area analysis. Heavy metal ions, including Pb(II), Cd(II), and Hg(II), were removed from wastewater using this graphene-chitosan (GO-Cs) xerogel and the removal efficiency was monitored through inductively coupled plasma mass spectrometry (ICP-MS). The effect of GO-Cs composition and pH on adsorption efficiency as well as the kinetics of adsorption was studied in detail. The study exhibited that this xerogel is more suited for the removal of Pb(II) than Cd(II) and Hg(II). It was demonstrated that the large surface area and highly porous structure of this nanomaterial make it a suitable candidate for the remediation of industrial wastewater pollutants.

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APA Style
Purnendu, , Satapathi, S. (2017). Graphene-based 3D xerogel as adsorbent for removal of heavy metal ions from industrial wastewater. Journal of Renewable Materials, 5(2), 96-102. https://doi.org/10.7569/JRM.2016.634134
Vancouver Style
Purnendu , Satapathi S. Graphene-based 3D xerogel as adsorbent for removal of heavy metal ions from industrial wastewater. J Renew Mater. 2017;5(2):96-102 https://doi.org/10.7569/JRM.2016.634134
IEEE Style
Purnendu and S. Satapathi, “Graphene-Based 3D Xerogel as Adsorbent for Removal of Heavy Metal Ions from Industrial Wastewater,” J. Renew. Mater., vol. 5, no. 2, pp. 96-102, 2017. https://doi.org/10.7569/JRM.2016.634134



cc Copyright © 2017 The Author(s). Published by Tech Science Press.
This work is licensed under a Creative Commons Attribution 4.0 International License , which permits unrestricted use, distribution, and reproduction in any medium, provided the original work is properly cited.
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