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ABSTRACT
Phase-field simulation of domain evolution in ferroelectric thin films with deadlayers
The International Conference on Computational & Experimental Engineering and Sciences 2011, 20(3), 87-88. https://doi.org/10.3970/icces.2011.020.087
Abstract
Phase field simulation is an effective way to predict the domain evolution in ferroelectric materials. A phase field model is developed to investigate the domain structures and polarization switching in in ferroelectric thin films with deadlayers. Simulation results show that the deadlayers as well as misfit strain have a significant influence on the domain structures and polarization switching in the ferroelectric thin films. It is found that the simulated switching electric field in ferroelectric thin films decreases with the thickness of the deadlayers increasing.Cite This Article
APA Style
Xia, Y., Wang, J. (2011). Phase-field simulation of domain evolution in ferroelectric thin films with deadlayers. The International Conference on Computational & Experimental Engineering and Sciences, 20(3), 87-88. https://doi.org/10.3970/icces.2011.020.087
Vancouver Style
Xia Y, Wang J. Phase-field simulation of domain evolution in ferroelectric thin films with deadlayers. Int Conf Comput Exp Eng Sciences . 2011;20(3):87-88 https://doi.org/10.3970/icces.2011.020.087
IEEE Style
Y. Xia and J. Wang, “Phase-field simulation of domain evolution in ferroelectric thin films with deadlayers,” Int. Conf. Comput. Exp. Eng. Sciences , vol. 20, no. 3, pp. 87-88, 2011. https://doi.org/10.3970/icces.2011.020.087
Copyright © 2011 The Author(s). Published by Tech Science Press.
This work is licensed under a Creative Commons Attribution 4.0 International License , which permits unrestricted use, distribution, and reproduction in any medium, provided the original work is properly cited.
This work is licensed under a Creative Commons Attribution 4.0 International License , which permits unrestricted use, distribution, and reproduction in any medium, provided the original work is properly cited.