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HEAT FLOW IN THIN FILMS VIA SURFACE PHONON-POLARITONS

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Department of Mechanical Engineering, Massachusetts Institute of Technology, Cambridge, MA, 02139, USA

* Corresponding Author: email

Frontiers in Heat and Mass Transfer 2010, 1(2), 1-6. https://doi.org/10.5098/hmt.v1.2.3005

Abstract

We present a calculation of the thermally generated electromagnetic flux propagating along the in-plane direction of a polar, thin film. The approach is based on fluctuational electrodynamics and the fluctuation-dissipation theorem. We find that for silicon carbide films between 5 nm and 100 nm thick, the thinner films transport more in-plane flux due to the long propagation length of the anti-symmetric surface phonon-polariton mode. Comparison of results obtained from the fluctuation-dissipation approach and the kinetic theory approach shows favorable agreement.

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APA Style
Chen, D.A., Chen, G. (2010). HEAT FLOW IN THIN FILMS VIA SURFACE PHONON-POLARITONS. Frontiers in Heat and Mass Transfer, 1(2), 1-6. https://doi.org/10.5098/hmt.v1.2.3005
Vancouver Style
Chen DA, Chen G. HEAT FLOW IN THIN FILMS VIA SURFACE PHONON-POLARITONS. Front Heat Mass Transf. 2010;1(2):1-6 https://doi.org/10.5098/hmt.v1.2.3005
IEEE Style
D.A. Chen and G. Chen, “HEAT FLOW IN THIN FILMS VIA SURFACE PHONON-POLARITONS,” Front. Heat Mass Transf., vol. 1, no. 2, pp. 1-6, 2010. https://doi.org/10.5098/hmt.v1.2.3005



cc Copyright © 2010 The Author(s). Published by Tech Science Press.
This work is licensed under a Creative Commons Attribution 4.0 International License , which permits unrestricted use, distribution, and reproduction in any medium, provided the original work is properly cited.
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