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CRITICAL MULTISCALE FLOW FOR INTERFACIAL SLIPPAGE IN MICROCHANNEL

Zhipeng Tanga, Yongbin Zhangb,*

a College of Mechanical Engineering, Changzhou Vocational Institute of Mechatronic Technology, Changzhou, 213164, Jiangsu, China
b College of Mechanical Engineering, Changzhou University, Changzhou, 213164, Jiangsu, China

* Corresponding Author: Email: email

Frontiers in Heat and Mass Transfer 2020, 14, 1-5. https://doi.org/10.5098/hmt.14.26

Abstract

The critical flow rate through a micro/nano slit pore for starting the adsorbed layer-fluid or adsorbed layer-wall interfacial slippage is calculated by a multiscale scheme. There are the physical adsorbed layers on the channel walls and the intermediate continuum fluid which are respectively in noncontinuum and continuum flows. The flow factor approach model for nanoscale flow is used to simulate the adsorbed layer flow, and a continuum model describes the continuum fluid flow. The boundary between the adsorbed layer and the continuum fluid or the boundary between the adsorbed layer and the channel wall are treated as the interfacial slippage. The result is also compared with that when the adsorbed layer is treated as an immobile solid layer.

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Cite This Article

APA Style
Tang, Z., Zhang, Y. (2020). CRITICAL MULTISCALE FLOW FOR INTERFACIAL SLIPPAGE IN MICROCHANNEL. Frontiers in Heat and Mass Transfer, 14(1), 1-5. https://doi.org/10.5098/hmt.14.26
Vancouver Style
Tang Z, Zhang Y. CRITICAL MULTISCALE FLOW FOR INTERFACIAL SLIPPAGE IN MICROCHANNEL. Front Heat Mass Transf. 2020;14(1):1-5 https://doi.org/10.5098/hmt.14.26
IEEE Style
Z. Tang and Y. Zhang, “CRITICAL MULTISCALE FLOW FOR INTERFACIAL SLIPPAGE IN MICROCHANNEL,” Front. Heat Mass Transf., vol. 14, no. 1, pp. 1-5, 2020. https://doi.org/10.5098/hmt.14.26



cc Copyright © 2020 The Author(s). Published by Tech Science Press.
This work is licensed under a Creative Commons Attribution 4.0 International License , which permits unrestricted use, distribution, and reproduction in any medium, provided the original work is properly cited.
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