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Analysis of Water Transport inside a Plant Xylem Vessel with Pitted Thickening

by Tianyu Xu, Lixiang Zhang

Faculty of Civil Engineering and Mechanics, Kunming University of Science and Technology, Kunming, 650500, China

* Corresponding Author: Lixiang Zhang. Email: email

Fluid Dynamics & Materials Processing 2020, 16(3), 525-536. https://doi.org/10.32604/fdmp.2020.09618

Abstract

In this article, computational fluid dynamics (CFD) are used to explore the dynamics of water transport inside the pitted thickening of a plant xylem vessel. A pitted thickening model combined with the Bernoulli equation is used to analyze the influence of various factors (namely, the inner diameter, thickening width, thickening height, thickening spacing, number of laps and adjacent pit axial rotation). The pressure drop and the flow resistance coefficient are the variable parameters for our analysis. The results show that these two parameters are proportional to the thickening height and thickening width, and inversely proportional to the inner diameter, thickening spacing and number of laps. Three different wall thickening structures of the vessel are compared and the pitted thickening vessel is shown to provide the largest structural flow resistance, the annular thickening vessel has the second largest resistance and the helical thickening vessel corresponds to the smallest resistance of the three structures.

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APA Style
Xu, T., Zhang, L. (2020). Analysis of water transport inside a plant xylem vessel with pitted thickening. Fluid Dynamics & Materials Processing, 16(3), 525-536. https://doi.org/10.32604/fdmp.2020.09618
Vancouver Style
Xu T, Zhang L. Analysis of water transport inside a plant xylem vessel with pitted thickening. Fluid Dyn Mater Proc. 2020;16(3):525-536 https://doi.org/10.32604/fdmp.2020.09618
IEEE Style
T. Xu and L. Zhang, “Analysis of Water Transport inside a Plant Xylem Vessel with Pitted Thickening,” Fluid Dyn. Mater. Proc., vol. 16, no. 3, pp. 525-536, 2020. https://doi.org/10.32604/fdmp.2020.09618



cc Copyright © 2020 The Author(s). Published by Tech Science Press.
This work is licensed under a Creative Commons Attribution 4.0 International License , which permits unrestricted use, distribution, and reproduction in any medium, provided the original work is properly cited.
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