Open Access

ARTICLE

Determination of a Safe Distance for Atomic Hydrogen Depositions in Hot-Wire Chemical Vapour Deposition by Means of CFD Heat Transfer Simulations

Lionel Fabian Fourie¹, Lynndle Square^2,*

1 Department of Physics and Astronomy, University of the Western Cape, Bellville, 7535, South Africa
2 Department of Physics, North-West University, Potchefstroom, 2520, South Africa

* Corresponding Author: Lynndle Square. Email:

Fluid Dynamics & Materials Processing 2020, 16(2), 225-235. https://doi.org/10.32604/fdmp.2020.08771

Received 31 January 2020; Accepted 12 March 2020; Issue published 21 April 2020

Abstract

A heat transfer study was conducted, in the framework of Computational Fluid Dynamics (CFD), on a Hot-Wire Chemical Vapour Deposition (HWCVD) reactor chamber to determine a safe deposition distance for atomic hydrogen produced by HWCVD. The objective of this study was to show the feasibility of using heat transfer simulations in determining a safe deposition distance for deposition of this kind. All CFD simulations were set-up and solved within the framework of the CFD packages of OpenFOAM namely; snappyHexMesh for mesh generation, buoyantSimpleFoam and rhoSimpleFoam as the solvers and paraView as the post-processing tool. Using a standard set of deposition parameters for the production of atomic hydrogen by HWCVD, plots of the gas temperature in the deposition region were produced. From these plots, we were able to determine a safe deposition distance in the HWCVD reactor to be in the range between 3 and 4 cm from the filament.

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Keywords

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