Table of Content

Open Access iconOpen Access

ARTICLE

Graded Dielectric Inhomogeneous Planar Layer Radome for Aerospace Applications

by Raveendranath U. Nair, Preethi D.S, R. M. Jha

Computers, Materials & Continua 2014, 40(2), 131-144. https://doi.org/10.3970/cmc.2014.040.131

Abstract

Controllable artificial dielectrics are used in the design of radomes to enhance their electromagnetic (EM) performance. The fabrication of such radome wall structures with controllable dielectric parameters seems to be an arduous task. Further even minor fluctuations of dielectric properties of radome wall due to fabrication uncertainties tend to result in drastic degradation of radome performance parameters. In the present work, a novel inhomogeneous radome with graded variation of dielectric parameters is proposed which limits the constraints on fabrication and facilitates excellent EM performance characteristics. This radome wall consists of five dielectric layers cascaded such that the middle layer has maximum dielectric constant and electric loss tangent. The dielectric parameters of the layers on both sides of the middle layer decrease in a graded (or step-wise) manner. The EM performance characteristics of the IPL radome with graded dielectric parameters are superior to that of conventional monolithic half-wave radome.

Keywords


Cite This Article

APA Style
Nair, R.U., D.S, P., Jha, R.M. (2014). Graded dielectric inhomogeneous planar layer radome for aerospace applications. Computers, Materials & Continua, 40(2), 131-144. https://doi.org/10.3970/cmc.2014.040.131
Vancouver Style
Nair RU, D.S P, Jha RM. Graded dielectric inhomogeneous planar layer radome for aerospace applications. Comput Mater Contin. 2014;40(2):131-144 https://doi.org/10.3970/cmc.2014.040.131
IEEE Style
R. U. Nair, P. D.S, and R. M. Jha, “Graded Dielectric Inhomogeneous Planar Layer Radome for Aerospace Applications,” Comput. Mater. Contin., vol. 40, no. 2, pp. 131-144, 2014. https://doi.org/10.3970/cmc.2014.040.131



cc Copyright © 2014 The Author(s). Published by Tech Science Press.
This work is licensed under a Creative Commons Attribution 4.0 International License , which permits unrestricted use, distribution, and reproduction in any medium, provided the original work is properly cited.
  • 1880

    View

  • 1651

    Download

  • 0

    Like

Share Link