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Numerical Simulation of Radiation-Induced Chemical Segregation and Phase Transformation in a Binary System

Efraín Hernández-Rivera1,2, Veena Tikare1, Lumin Wang2

Advanced Nuclear Energy Programs, Sandia National Laboratories, Albuquerque, NM, USA.
Nuclear Engineering and Radiological Sciences, University of Michigan, Ann Arbor, MI, USA.

Computers, Materials & Continua 2013, 38(2), 91-103. https://doi.org/10.3970/cmc.2013.038.091

Abstract

We present the development of a hybrid Monte Carlo-phase field model that is able to simulate radiation induced chemical segregation and the corresponding phase transformation and nano-structure evolution. Under irradiation by a lowenergy ion beam, defects (vacancies) are created and accumulate. In a binary crystalline material, AB, studied in this work, these defects are of the two types A and B and diffuse at different rates. These differential diffusivities are sufficient driving mechanisms for the formation of chemically distinct regions with accompany changes in phases and nano-structure. In this work, we present a model that can simulate these changes by treating the differential diffusion of the vacancies of the two components.

Keywords

chemical segregation, Monte Carlo, phase field, phase transformation.

Cite This Article

APA Style
Hernández-Rivera, E., Tikare, V., Wang, L. (2013). Numerical simulation of radiation-induced chemical segregation and phase transformation in a binary system. Computers, Materials & Continua, 38(2), 91–103. https://doi.org/10.3970/cmc.2013.038.091
Vancouver Style
Hernández-Rivera E, Tikare V, Wang L. Numerical simulation of radiation-induced chemical segregation and phase transformation in a binary system. Comput Mater Contin. 2013;38(2):91–103. https://doi.org/10.3970/cmc.2013.038.091
IEEE Style
E. Hernández-Rivera, V. Tikare, and L. Wang, “Numerical Simulation of Radiation-Induced Chemical Segregation and Phase Transformation in a Binary System,” Comput. Mater. Contin., vol. 38, no. 2, pp. 91–103, 2013. https://doi.org/10.3970/cmc.2013.038.091



cc Copyright © 2013 The Author(s). Published by Tech Science Press.
This work is licensed under a Creative Commons Attribution 4.0 International License , which permits unrestricted use, distribution, and reproduction in any medium, provided the original work is properly cited.
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