Open Access

ARTICLE

Effects of High Magnetic Field and Post-Annealing on the Evaporated Ni/Si (100) Thin Films

Jiaojiao Du¹, Guojian Li¹, Qiang Wang^1,2, Yongze Cao¹, Jicheng He¹, Yonghui Ma¹

1 Key Laboratory of Electromagnetic Processing of Materials (Ministry of Education), Northeastern University, Shenyang 110819, China.
2 Corresponding author. Key Laboratory of Electromagnetic Processing of Materials (Ministry of Education), Northeastern University, No. 3-11 Wenhua Road, Heping District, Shenyang, Liaoning Province, 110819, P. R. China.

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