Open Access

ARTICLE

High Magnetic Field Annealing Dependent the Morphology and Microstructure of Nanocrystalline Co/Ni Bilayered Films

Donggang Li^1,2, Alexandra Levesque², Qiang Wang^1,3,2, Agnieszka Franczak², Chun Wu¹, Jean-Paul Chopart², Jicheng He¹

1 Key Laboratory of Electromagnetic Processing of Materials (Ministry of Education), Northeastern University, Shenyang, 110004, China
2 LACM-DTI, Université de Reims Champagne-Ardenne, B.P. 1039, 51687 Reims Cedex 2, France
3 Corresponding author. Key Laboratory of Electromagnetic Processing of Materials (Ministry of Education), Northeastern University, No.3-11 Wenhua Road, Heping District, Shenyang, Liaoning Province, 110004, P.R.China Tel: +86-24-83681726, Fax: +86-24-83681758, E-mail address: wangq@mail.neu.edu.cn