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Effective Interfacial Thickness in Dissimilar Materials through Nanoindentation

S. S. Pulla1, Y. C. Lu2

Dept of Mechanical Engineering, University of Kentucky, Lexington, KY, U.S.A

Computers, Materials & Continua 2012, 29(3), 263-278. https://doi.org/10.3970/cmc.2012.029.263

Abstract

The nanoindentation technique is used to quantify the interfaces between dissimilar materials. The interfaces can be generally referred as to the transition regions in polymers due to environmental aging, or the regions between fibers and polymer matrix in composites, or other similar situations. It is proposed to use a nanoindenter equipped with small spherical tip to cross-indent the interfaces of dissimilar materials. The nanoindentation tests were carried out through 3-dimensional finite element simulations with varying properties of the two dissimilar materials, including various combinations of modulus (E1/E2), yield strength (σy1y2), hardening index (n1/n2), and the interface sizes (R/T). The mechanical properties are calculated across the interfaces and a quantitative model for predicting the effective interfacial thickness is established.

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Cite This Article

APA Style
Pulla, S.S., Lu, Y.C. (2012). Effective interfacial thickness in dissimilar materials through nanoindentation. Computers, Materials & Continua, 29(3), 263-278. https://doi.org/10.3970/cmc.2012.029.263
Vancouver Style
Pulla SS, Lu YC. Effective interfacial thickness in dissimilar materials through nanoindentation. Comput Mater Contin. 2012;29(3):263-278 https://doi.org/10.3970/cmc.2012.029.263
IEEE Style
S.S. Pulla and Y.C. Lu, “Effective Interfacial Thickness in Dissimilar Materials through Nanoindentation,” Comput. Mater. Contin., vol. 29, no. 3, pp. 263-278, 2012. https://doi.org/10.3970/cmc.2012.029.263



cc Copyright © 2012 The Author(s). Published by Tech Science Press.
This work is licensed under a Creative Commons Attribution 4.0 International License , which permits unrestricted use, distribution, and reproduction in any medium, provided the original work is properly cited.
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