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Computer Modeling Chemical Vapor Infiltration of SiC Composites

by Yaochan Zhu, Eckart Schnack, Al Mahmudur Rahman

1 Karlsruhe Institute of Technology, Germany. Email: yao.zhu@kit.edu

Computer Modeling in Engineering & Sciences 2013, 92(3), 315-326. https://doi.org/10.32604/cmes.2013.092.315

Abstract

A novel multiphase field model is formulated to simulate the complex microstructure evolution during chemical vapor infiltration (CVI) process, which is widely used technique to produce SiC matrix composites reinforced by SiC fibers in ceramic engineer. The model consists of a set of nonlinear partial differential equations by coupling Ginzburg-Landau type phase field equations with mass/heat balance equations as well as modified Navier-Stokes equations. The microstructure evolution of preferential codeposition of Si, SiC and C under high ratio of H2 to MTS is simulated. The simulation is in good agreement with experiments result. The potential risk of blockage of the premature pores is predicted. By investigating the effect of gas flow and chemical reaction on concentration field of MTS, it is found that the gas flow is in favor of the homogeneous distribution of MTS while this distribution is mainly dominated by chemical reaction. Meanwhile, the effect of thermal gradient on CVI process is investigated.

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APA Style
Zhu, Y., Schnack, E., Mahmudur Rahman, A. (2013). Computer modeling chemical vapor infiltration of sic composites. Computer Modeling in Engineering & Sciences, 92(3), 315-326. https://doi.org/10.32604/cmes.2013.092.315
Vancouver Style
Zhu Y, Schnack E, Mahmudur Rahman A. Computer modeling chemical vapor infiltration of sic composites. Comput Model Eng Sci. 2013;92(3):315-326 https://doi.org/10.32604/cmes.2013.092.315
IEEE Style
Y. Zhu, E. Schnack, and A. Mahmudur Rahman, “Computer Modeling Chemical Vapor Infiltration of SiC Composites,” Comput. Model. Eng. Sci., vol. 92, no. 3, pp. 315-326, 2013. https://doi.org/10.32604/cmes.2013.092.315



cc Copyright © 2013 The Author(s). Published by Tech Science Press.
This work is licensed under a Creative Commons Attribution 4.0 International License , which permits unrestricted use, distribution, and reproduction in any medium, provided the original work is properly cited.
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