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Simulation of Anisotropic Crystalline Etching using a Continuous Cellular Automata Algorithm

Zhenjun Zhu, Chang Liu1

Micro Actuators, Sensors and Systems Group, 208 North Wright Street, University of Illinois, Urbana, IL 61801.

Computer Modeling in Engineering & Sciences 2000, 1(1), 11-20. https://doi.org/10.3970/cmes.2000.001.011

Abstract

We present results on the development of an anisotropic crystalline etching simulation (ACES) program based on a new continuous Cellular Automata (CA) model, which provides improved spatial resolution and accuracy compared with the conventional and the stochastic CA \mbox{methods}. Implementation of a dynamic CA technique provides increased simulation speed and reduced memory requirement (5x). A first ACES software based on common personal computer platforms has been realized. Simulated results of etching match well with experiments. We have developed a new methodology to obtain the etch-rate diagram of anisotropic etching efficiently using both experimental and numerical techniques.

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Cite This Article

Zhu, Z., Liu, C. (2000). Simulation of Anisotropic Crystalline Etching using a Continuous Cellular Automata Algorithm. CMES-Computer Modeling in Engineering & Sciences, 1(1), 11–20.



cc This work is licensed under a Creative Commons Attribution 4.0 International License , which permits unrestricted use, distribution, and reproduction in any medium, provided the original work is properly cited.
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