Open Access

ARTICLE

Simulation of Anisotropic Crystalline Etching using a Continuous Cellular Automata Algorithm

Zhenjun Zhu, Chang Liu¹

1 Micro Actuators, Sensors and Systems Group, 208 North Wright Street, University of Illinois, Urbana, IL 61801.

Computer Modeling in Engineering & Sciences 2000, 1(1), 11-20. https://doi.org/10.3970/cmes.2000.001.011

Abstract

We present results on the development of an anisotropic crystalline etching simulation (ACES) program based on a new continuous Cellular Automata (CA) model, which provides improved spatial resolution and accuracy compared with the conventional and the stochastic CA \mbox{methods}. Implementation of a dynamic CA technique provides increased simulation speed and reduced memory requirement (5x). A first ACES software based on common personal computer platforms has been realized. Simulated results of etching match well with experiments. We have developed a new methodology to obtain the etch-rate diagram of anisotropic etching efficiently using both experimental and numerical techniques.

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Keywords

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