Simulation of Anisotropic Crystalline Etching using a Continuous Cellular Automata Algorithm
Zhenjun Zhu, Chang Liu

doi:10.3970/cmes.2000.001.011
Source CMES: Computer Modeling in Engineering & Sciences, Vol. 1, No. 1, pp. 11-20, 2000
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Keywords etching simulation, anisotropic etching, cellular automata, continuous cellular automata
Abstract We present results on the development of an anisotropic crystalline etching simulation (ACES) program based on a new continuous Cellular Automata (CA) model, which provides improved spatial resolution and accuracy compared with the conventional and the stochastic CA \mbox{methods}. Implementation of a dynamic CA technique provides increased simulation speed and reduced memory requirement (5x). A first ACES software based on common personal computer platforms has been realized. Simulated results of etching match well with experiments. We have developed a new methodology to obtain the etch-rate diagram of anisotropic etching efficiently using both experimental and numerical techniques.
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